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 Unique Non-parametric Characterization Model

Unique \(n(\lambda)-k(\lambda)\) characterization option assumes arbitrary but smooth dependence of refractive index and extinction coefficient on wavelength. These models should be used in most complicated cases. For example, when it is required to characterize thin films in wide spectral range and simple models (Cauchy, Sellmeier) are not suitable. Below we show fittings of experimental \(R/T\) data by model data and evolution of n-k wavelength dependencies. The data are related to TiO2 thin film on Suprasil substrate.

More complicated example can be found here. Further details and mathematical formulas can be found in our publications. 

non-parametric characterization model free characterizzation approach
optical charactrization model free approach

See more in our publications:

  1. T.V. Amotchkina, V. Janicki, J. Sancho-Parramon, A.V. Tikhonravov, M.K. Trubetskov, and H. Zorc. "General approach to reliable characterization of thin metal films." Appl. Opt. 50, 10, 1453-1464 (2011).
  2. T.V. Amotchkina, M.K. Trubetskov, V. Pervak, S.Schlichting, H. Ehlers, D. Ristau, and A.V. Tikhonravov. "Comparison of algorithms used for optical characterization of multilayer optical coatings." Appl. Opt. 50, 3389-3395 (2011).
  3. T. Amotchkina, M. Trubetskov, V. Pervak, and A. Tikhonravov. "Design, production and reverse engineering of two-octave antireflection coatings." Appl. Opt. 50, 6468-6475 (2011).
  4. V. Janicki, T.V. Amotchkina, J. Sancho-Parramon, H. Zorc, M.K. Trubetskov, and A.V. Tikhonravov. "Design and production of bicolour reflecting coatings with Au metal island fims." Opt. Express 19, 25521-25527 (2011).
  5. T.V. Amotchkina, M.K. Trubetskov, A. V. Tikhonravov, V. Janicki, J. Sancho-Parramon, and H. Zorc. "Comparison of two techniques for reliable characterization of thin metal-dielectric films." Appl. Opt. 50, 6189-6197 (2011).

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