In 2014,  OptiLayer implemented new analysis,  design and characterization features in order to solve more complicated problems, to provide better visualization possibilities of the results and to make working in OptiLayer environment easier.    

In OptiLayer:

• Robust synthesis algorithm was developed. The algorithm takes errors in layer thicknesses and refractive index offsets into account. 

• A novel design algorithm Sensitivity-Directed Refinement is aimed at obtaining structurally simple designs, typically with no thin layers.
• Taper function tool has been developed in order to design coatings with thickness non-uniformity (curved or large substrates, non-uniformity in the deposition plant etc.)
• In the Color Evaluation window it is now possible to specify a range of angles for calculating color characteristics of a coating. This allows you to observe trajectories of color characteristics as functions of incidence angle.
• Using Material Dispersion option it is possible to calculate the dispersion accumulated by a pulse passing through dispersive medium of the given thickness.  
• A new ability to display partial merit function (MF) values is added. It is now possible to display partial MF values with or without taking into account respective weights which are used to form MF Total value.
• In the case of Color Error Analysis statistical characteristics for the CIEDE 2000 function have been added.
• A pre-production estimation of errors for broadband and monochromatic types of optical monitoring can be now also performed for the case of monitoring with multiple witness chips.
• Improvements in Monochromatic Spreadsheet have been introduced.
• There is a new Strategy 5 for an automatic generation of monitoring spreadsheets for monitoring techniques that explore corrections of termination levels based on monitoring signal extrema. It implements an additional set of requirements for choosing optimal monitoring wavelengths as compared to the previously introduced Strategy 4.
• New import/export features have been added for your convenience:
  • Export of monitoring spreadsheets in the form of Excel-type spreadsheets (Right-click mouse menu in the OptiMonitor window);
  • Export to Optorun monitoring form at the right-click of mouse menu in the OptiMonitor window;
  • Additional improvements of monitoring spreadsheet printing in the form of configuration dialog and printing data for each witness chip on a separate paper sheet. 
  • There is now ability to export rugate designs to LMR, ODX, and DSG files. In the previous version of OptiLayer rugate export was difficult because of the limitations on the number of materials in one directory. In Version 10.48, the number of materials is 999 and it is enough to export rugates.
  • In OptiLayer and OptiRE, import from ODX and DSG files has been improved: Now loaded materials and abbreviations are preserved during import operations which allows you to perform multiple import operations to the same Problem directory with preserving already available material abbreviations and designs using these abbreviations.
  • In OptiChar and OptiRE, import of UDS files from Hitachi U-4100 and AUH-4150 spectrophotometers has been implemented.

In OptiChar and OptiRE:

• In OptiChar more reliable algorithms of the Refinement option have been implemented. They use a special globalization option that performs multi-start optimizations in the case of models with bulk and/or surface inhomogeneity. In comparison with algorithms from previous versions, the new algorithm starts from different starting points and searches for global solutions.

• Color evaluation is now also available in OptiChar and OptiRE.

• In OptiRE, a new database BBM Movies has been introduced. This database can store log files recorded by broad band monitoring devices. The new option BBM Movie Data of the Data menu allows you to analyze these files in order to study specifics of broad band monitoring procedures.

• There are new opportunities for the output of results obtained by OptiLayer software: 

  • Output of Materials Dispersion is possible: Results > Material Dispersion Report
  • The Substrate Report in OptiChar has a new output field:  Measurements Correction in the case of Substrate characterization with measurement correction option switched on. Information in his field can be useful for calibration of spectrophotometers.
• OptiLayer Substrate and Layer Material catalogs have been updated with 29 new entries (metals and ITO data):

• Two new Examples demonstrating an application of OptiChar module of OptiLayer software have been added to the new OptiLayer release.

  • One of the new examples (Example 5) demonstrates application of n-k option;

  • Another example (Example 6) demonstrates application of Porosity options.

News in COM Automation

Interface and Hardware:

• • In the Gradual Evolution Setup window a new check box "Exclude Inactive Materials" is added. If this check box is active then layers of Inactive materials will be excluded from consideration during the gradual evolution step of increasing design total optical thickness.

  • In the Thin Layer Removal option an ability to sort layers with respect to increasing or decreasing values of any column is added.

  • Convenient modifications are introduced in the edit and other auxiliary options of all programs. At the Data tab of the General Configuration window a new checkbox Go to Next Cell on Enter  is added. If this checkbox is marked then pressing the Enter key during spreadsheet editing will advance current cell selection to the next cell available. This is a global option, i.e. it configures your interface independently on the Problem directory.

  • The Column Editor can be now applied to Formula coefficients at the Formula tab of the Layer Material editing window.

  • Opening of Backup/Restore dialog has been significantly accelerated, especially at computers connected to large networks.

  • It is possible to start several OptiLayer, or OptiChar, or OptiRE programs simultaneously!  In the previous versions only one program was possible to start. You can run, for example, computations of a complicated design and simultaneously work with another problem.  In this case,  the next OptiLayer will propose to select a different Problem Directory, and already existing programs will be minimized (and will proceed with computations).